We shall pursue (a) the development of broadband dispersive optics permitting the shaping of few-cycle waveforms within the wave cycle and their compression to durations shorter than the carrier period (sub-cycle waveforms) in close collaboration with project B.3.1; (b) the development of broadband multilayer optics exhibiting both high damage threshold and high reflectivity for high-repetition-rate (i.e. high average power) and low-repetition-rate (i.e. high pulse energy) laser sources, in close collaboration with projects A.1.4 and A.1.5, respectively; (c) the further advancement of all-dispersive-mirror compressors for chirped-pulse amplification in Yb:YAG lasers and Ti:Sa lasers, in concerted efforts with projects A.1.4 and A.1.5, respectively; (d) the extension of dispersive multilayer optics into new spectral ranges towards the deep (--> 200 nm) and even vacuum UV (--> < 100 nm) and mid IR (--> 3000 nm), in cooperation with projects A.1.1 and B.3.1.
In addition to electron beam evaporation and RF magnetron sputtering we would like to employ ion beam deposition for the development of ultradense and low-defect-density dielectric multilayer systems. This is of utmost importance for improving the reflectivity and resistance against high peak-power and average-power laser radiation which is needed for virtually all source development projects in Research Area A.1. Theoretical simulation is supported by a collaboration with the group of A. Tikhonravov (Moscow State University).